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filingDate 1984-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_01850141fbccbd433629b7aa5f37892d
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publicationDate 1986-01-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S6114631-A
titleOfInvention Photosensitive resin composition
abstract PURPOSE:To obtain a photosensitive compsn. superior in resolution and high in sensitivity by incorporating a chemical agent capable of reacting with conjugated carbonyl groups of a polyvinyl alcohol type resin having the specific polymn. degree or below with a polymerizable vinyl compd., and a photopolymn. initiator. CONSTITUTION:The PVA type resin having an average polymn. degree of <=1,000 and an average saponification degree of 50-100mol% is treated with a chemical agent highly reactive with carbonyl groups, such as alkali or alkaline earth metal or NaBH4 or hydrazine, and further, a chemical agent high in tendency to addition reaction with double bonds like a vinylene group, such as Br, from room temp. to some higher temp. to enhance light transmittance. A printing plate or the like high in sensitivity and superior in resolution can be efficiently obtained by using a photosensitive resin compsn. contg. this resin, and a polymerizable vinyl compd., such as hydroxy(meth)acrylate or N-methylol-(meth) acrylate, together with a photopolymn. initiator.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007072152-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H01233442-A
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015000890-A
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priorityDate 1984-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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