| abstract |
PURPOSE: To enhance storage stability, resolution, and adhesion to a base by preparing a polyamide acid copolymer from a speified organosilicon compd., tetracarboxylic dianhydride, and an org. compd. having amino group. n CONSTITUTION: A polyamide acid copolymer (A) is obtained by reacting an organosilicon compd. represented by average molecular formula I (R 1 is a univalent org. group; R 2 , R 3 are each bivalent org. group; 0<a, b≤3, 0≤c≤2, 0<a+b+ c≤4, and d is 0 or 1), tetra carboxylic dianhydride represented by formula II (R 4 is a quadrivalent org. group), and an org. amino compd. represented by formula III (R 5 is a bivalent org. group; R 6 is a tervalent org. group; and R 7 is SO 2 or CO.) in an org. solvent. A photosensitive compsn. is composed of the copolymer (A), a mercapto-contg. org. compd. (B) having ≤2HS- in the molecule and contg. HS-group equal moles to or less than moles of CH 2 =CH-R 2d -con tained in the organosilicon compd. of formula I , and a photosensitive material in an amt. of 0W5pts.wt. per 100pts.wt. of the solid matter of the copolymer (A) and the compd. (B). A preferable amt. of said tetracarboxylic dianhydride to be added is 0.4W0.6mol per mole of the total NH 2 groups of the components. n COPYRIGHT: (C)1985,JPO&Japio |