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filingDate 1983-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_153fdfb6540c332897c4b5906359634a
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publicationDate 1985-05-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S6076738-A
titleOfInvention Photopolymerizable composition
abstract PURPOSE:To obtain a photopolymerizable composition having superior sensitivity and suitable for use as a photoresist for fine working by mixing a specified addition-polymerizable compound with oxime ester and aminophenyl ketone. CONSTITUTION:One or more kinds of addition-polymerizable compounds (A) each having >=100 deg.C b.p. under ordinary pressure such as diethylene glycol dimethacrylate and divinyl phthalate are mixed with oxime ester (B) having 40- 63kcal/mol triplet energy such as 2-acetylnaphthalene-o-acetyloxime and aminophenyl ketone (C) represented by the formula (where each of R1-R4 is H or 1- 4C alkyl) to obtain the desired photopolymerizable composition. A preferred example of the aminophenyl ketone represented by the formula is 4,4'-bis(dimethylamino)benzophenone.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0484083-A1
priorityDate 1983-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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