http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6055630-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38520f366e74704305b34fb93a81121e
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
filingDate 1983-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04f8330435c3de57393a5bb3a817e904
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2207f9cf4d60935339c52f1ce1c5bee8
publicationDate 1985-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S6055630-A
titleOfInvention Method for forming resist pattern
abstract PURPOSE:To facilitate pattern formation through lifting-off, by a method in which a film of quinone diazoester formed as a resist film on the substrate surface is radiated with far ultraviolet rays, and thereafter developed with acetic ester or cyclohexanone developing solution added with water and alcohol. CONSTITUTION:A film of oligomer quinone diazoester formed as a resist film on the surface of a substrate is exposed to far ultraviolet radiation, and thereafter developed by means of acetic ester or cyclohexanone developing solution added with water and alcohol. Thus, the resist pattern can be easily made overhung in its profile by an order of submicrons, whereby high sensitivity and high resolution can be realized. Moreover, the resist pattern is not cracked after development, so that desirable heat resistance, solubility, and adhesive properties can be obtained in the resist pattern.
priorityDate 1983-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5559459-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S57108851-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5466776-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5543537-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S57164736-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID4650
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7967
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID702
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419538408
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419522783
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419489307
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8857
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419538410

Total number of triples: 31.