| abstract |
PURPOSE: To obtain an organopolysiloxane material unchangeable against the lapse of time, soluble in org. solvents, and high in heat softening point by forming the intermediate layer of a 3-layer resist with organopolysiloxane represented by a specified general formula. n CONSTITUTION: The intermediate layer formed on the lower resist layer made of an org. polymer formed on a substrate is made of an organopolysiloxane represented by the formula in which R is a hydrocarbon, H, OH, or alkoxy group, and m+n+p+q=1, and m>0, n,p,q≥0, m/q≤1, and m/p≤0.3. The upper resist layer made of a polymer bridgeable or decomposable with radiation is laminated on it, and a prescribed pattern is formed on the upper layer. Then, the intermediate layer is etched with an org. solvent, and further, the lower layer is etched in succession to form the 3-layer resist pattern. n COPYRIGHT: (C)1985,JPO&Japio |