http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S60247236-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1984-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b72556f8a2c839a837ae19eebfd6330 |
| publicationDate | 1985-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S60247236-A |
| titleOfInvention | Resist |
| abstract | PURPOSE:To inhibit the swelling of the exposed part of a polysiloxane-base resist, to prevent the deformation of a resist pattern after development, and to increase the accuracy of lithography by removing a component having a specified low mol.wt. or below from the resist. CONSTITUTION:The swelling of a polysiloxane-base resist during exposure is inhibited or prevented by removing a component having <=50,000mol.wt. from the resist, and an increase in pattern width especially at the boundary part of a visual field subjected to double exposure can be prevented. In case of the polymethylsiloxane-base resist, a component having <=50,000mol.wt. is removed, and in case of the resist contg. polyphenylmethylsiloxane having <=0.15mol% vinyl substituents as the principal component, a component having <=10,000mol.wt. is removed. By removing a low molecular component from the resist as mentioned above, swelling caused by linear molecules entering into an endless network formed by exposure is hindered. An increase in pattern width is prevented, the accuracy of lithography is increased, and superior pattern resolution is attained. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S63199261-U http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0546030-Y2 |
| priorityDate | 1984-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393356 |
Total number of triples: 17.