http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6024543-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-43 |
| filingDate | 1983-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6fd51314a114ee8c9dcec29c50007db http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_267e0d7eff7fcbfeb02f01cdcc1c87c9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4baea6a0cb3bc9950d6cb909f2a99d1b |
| publicationDate | 1985-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S6024543-A |
| titleOfInvention | Photosensitive silicone resin composition |
| abstract | PURPOSE:To improve the quality of a pattern by adding polysiloxane prepd. by hydrolyzing and polymerizing a specified silane compound and an aromatic azido compound and/or an aromatic sulfonylazido compound. CONSTITUTION:This photosensitive silicone resin composition contains polysiloxane (A) prepd. by hydrolyzing and polycondensing a silane compound represented by formula I , II, III or IV (where X is a hydrolyzable group, and R is a univalent hydrocarbon group) and an aromatic azido compound and/or an aromatic sulfonylazido compound (B). Compounds represented by the formula I include SiCl4 and Si(OCH3)4, and compounds represented by the formula II include CH3SiCl3 and CH3Si(OCH3)3. Silane compounds represented by the formula III and IV are prepd. by changing the number of each group in the formula II. The photosensitive compound added to the polysiloxane makes the light irradiated and unirradiated parts different from each other in solubility in a developer, so a pattern is formed. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H06240143-A |
| priorityDate | 1983-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.