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filingDate 1984-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f3190471c260c04d1f15847bb1ffe78d
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publicationDate 1985-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S60243954-A
titleOfInvention Ion source
abstract PURPOSE:To enable oxygen ion implantation of at least 100mA to be stably performed by maintaining the distribution of an electric field near the lead-out electrode constant for a long time by preparing the lead-out electrode from a material containing an electrically conductive oxide. CONSTITUTION:A lead-out electrode 2 is formed by a tin material containing conductive tin oxide. The inner surface of a plasma chamber 8 is coated with a cylindrical quartz tube 7 so that metallic impurities are not produced by plasma striking the surface. Owing to the above structure, it is possible to stably lead out an oxygen beam.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6418568-U
priorityDate 1984-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 26.