| abstract |
PURPOSE: To obtain a photosensitive resin compsn. high in sensitivity resolution and enhanced in resistance to dry etching by using a combination of a siloxane polymer represented by a specified general formula, a bisazido compd., and a sensitizer. n CONSTITUTION: The photosensitive resin compsn. is composed of a polysiloxane polymer represented by formula I [R, R', R" are each same or different, and each is H, alkyl, or phenyl; X is a group selected from formulae II, III, and IV; and (l), (m), (n) are each 0 or a positive integer, and (l) and (m) are not simultaneously 0], a bisazido compd., represented by formula V (R 1 is a simple bond, -CH 2 , C or the like, and R 2 is H or halogen), and a sensitizer, such as aromatic carbonyl or benzoyl compds. n COPYRIGHT: (C)1985,JPO&Japio |