http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S60159015-A

Outgoing Links

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filingDate 1984-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8402aa5c92ef740e5a0cfdd558b33ebf
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publicationDate 1985-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S60159015-A
titleOfInvention Manufacture of very thin film
abstract PURPOSE:To make it possible to form a very thin film of polymer free from any defect when the very thin film is formed on a water surface, by including in a solution a cycloalkenyl hydroperoxide in the range of 0.5-20wt% to increase the extension of the solution. CONSTITUTION:The concentration of a cycloalkenyl hydroperoxide in a solution containing it, a hydrocarbon solvent optionally substituted by a halogen atom and a silicon-containing polymer is 0.5-20wt%. By feeding such a polymer solution onto a water surface, a thin film of the solution is developed on the water surface, and when the solvent is evaporated from the solution film, a very thin film of the polymer can be formed. The means for feeding the polymer solution onto a water surface is not limited. When the polymer solution according to the invention is dropped intermittently drop by drop onto a water surface, the drop will immediately spread on the water surface to form a circular very thin film.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9008474-A1
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Total number of triples: 25.