http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S60143334-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0345001e918f6aed4484e790b33ddcb6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1983-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9636f56874024e53106c726205c62bf2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17128fab109a509904cd2f2be8cf7cb7 |
| publicationDate | 1985-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S60143334-A |
| titleOfInvention | Resist |
| abstract | PURPOSE:To obtain an electron beam and X-ray resist prevented from disturbance occurring at the interface between adjacent two patterns exposed at two different times one after the lapse of time from the other, and high in sensitivity and resolution by using a resist composed essentially of polymethylsiloxane specified in the range of weight average mol.wt. CONSTITUTION:An objective electron beams and X-ray resist is composed essentially of polymethylsiloxane having a weight average mol.wt. of 350,000- 600,000. Disturbance due to expansion, etc., occurring at the interface between two adjacent resist patterns, the exposure time of one being after the lapse of time from that of the other, can be prevented. The electron beam sensitivity can be further enhanced by replacing <=0.1% of the methyl groups of the polymethylsiloxane molecular chain by vinyl groups. Sensitivity can be lowered and resolution can be enhanced by using polymethylsiloxane having >=500,000 weight average mol.wt. and replacing the methyl groups by phenyl groups. |
| priorityDate | 1983-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 21.