http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S60124980-A

Outgoing Links

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-1608
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L39-24
filingDate 1983-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4bb46b28d0930f6c5c8af577bb192353
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ab201fa1f60b8de8dcd1506ebd1b400
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a6763be461a9be091c38691e4547186
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publicationDate 1985-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S60124980-A
titleOfInvention Manufacture of josephson element
abstract PURPOSE:To easily obtain the titled element by a method wherein the first superconductor electrode is provided on a substrate by the treatment of reactive sputter etching using CBrF3 gas, and a tunnel barrier layer and the second superconductor electrode are successively formed on the electrode. CONSTITUTION:The first superconductor layer 3 made of Nb is formed on the substrate 2 with an Si oxide insulator 1 formed on the surface. A photo resist mask layer 4 having a required pattern is formed on the layer 3. Next, the layer 3 is treated by reactive sputter etching using CBrF3 gas with the mask layer 4 as a mask, and thus the first superconductor electrode 5 having the pattern corresponding to the pattern from the layer 3 to the layer 4 is formed. Besides, the tunnel barrier layer 6 and the second superconductor electrode 7 made of Pb or Pb alloy or Nb are successively formed on the electrode 5.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02322-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H01156482-A
priorityDate 1983-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 20.