http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S60108840-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate | 1983-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d16a51e7ae8ecda1ae7b8de343e691ba http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4e4a0429466df1e0e488f2176cab62d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a13215a0c6407bc80d177c297a3eea49 |
| publicationDate | 1985-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S60108840-A |
| titleOfInvention | Photosensitive heat resistant material |
| abstract | PURPOSE:To enable fine working with direct light and to simplify process by forming a titled material of specific organoladder polysiloxane and specific bis- azide compd. CONSTITUTION:A titled material is formed of the organoladder polysiloxane obtd. by bringing the organoladder polysiloxane expressed by the formula I and the unsatd. compd. expressed by the formula II into reaction in an org. solvent and the bis-azide compd. expressed by the formula N3-R4-N3. The organoladder polysiloxane and the unsatd. compd. are mixed at a rate of 1-3 alkoxy groups of the unsatd. compd. for one hydroxyl group of the organoladder polysiloxane. Such photosensitive heat resistant material is coated on a silicon water or the like and light or radiations are irradiated through a mask having a prescribed pattern thereto and when the material is developed by using a solvent of an arom. hydrocarbon or the like, the unexposed part is washed away and a relief pattern having a sharp end face is obtd. In the formulas, R1-R3 are lower alkyl groups such as a methyl group and a propyl group, X is hydrogen atom, a methyl group, etc., l is 1-3, m is 0-4, n is 2-100. |
| priorityDate | 1983-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 33.