http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S60108839-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate | 1983-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a13215a0c6407bc80d177c297a3eea49 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d4e4a0429466df1e0e488f2176cab62d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d16a51e7ae8ecda1ae7b8de343e691ba |
| publicationDate | 1985-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S60108839-A |
| titleOfInvention | Photosensitive heat resistant material |
| abstract | PURPOSE:To enable fine working direct light and to simplify process by forming a titled material of specific organoladder polysiloxane and bis-silyl compd. and photosensitizer. CONSTITUTION:A titled material is formed of the organoladder polysiloxane obtd. by bringing the organoladder polysiloxane expressed by the formula I which is terminal hydroxylader type organopolysiloxane and the unsatd. compd. expressed by the formula II into reaction in an org. solvent as well as bis-silyl compd. and photosensitizer. The organoladder polysiloxane and the unsatd. compd. are mixed at a ratio of 1-3 alkoxy groups of the unsatd. compd. with one hydroxyl group of the organoladder polysiloxane. Such heat resistant photosensitive material is coated on a silicon wafer or the like and light or radiations are irradiated through a mask having a prescribed pattern thereto, then the material is developed by an arom. hydrocarbon solvent or the like, then the unexposed part is washed away and the relief pattern having a sharp end face is obtd. In the formulas, R1-R3 are lower alkyl groups such as a methyl group and a propyl group, X is a hydrogen atom, methyl group, etc., l is 1-3, n is 2-100. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001026717-A |
| priorityDate | 1983-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 29.