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filingDate 1983-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5ad7f0c4964c0156c691819dfa6633b
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publicationDate 1985-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S60108349-A
titleOfInvention Surface treatment of fluoride glass
abstract PURPOSE: To remove completely water, OH group, etc. remaining of the surface of glass without losing smoothness, by subjecting the surface of optically ground fluoride glass to high-frequency sputtering in a specific gas atmosphere. n CONSTITUTION: The optically previously ground fluoride glass 4 is attached to the chuck 6 of the rod supporting member 5 fixed to the column 7 and rotated. One or more gases selected from CF 4 , C 2 F 6 , C 3 F 8 , C 4 F 10 , CCl 4 , Cl 2 , F 2 , PCl 3 CBrF 3 , BCl 3 , CHClF 2 , and CCl 2 F 2 is fed from the intake vent 2 of the chamber 1, high-frequency electrical power is sent from the high-frequency electric source 12 to the high-frequency electrodes 11, the surface of the glass 4 is subjected to high-frequency sputtering, the surface of the glass 4 is thinly ground to removed adsorbed water, OH group, etc. n COPYRIGHT: (C)1985,JPO&Japio
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priorityDate 1983-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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