http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S59232286-A

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filingDate 1983-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b3fa17181a6ed86c190aeb0fb6c7a96e
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publicationDate 1984-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S59232286-A
titleOfInvention Electrolytic refining method of copper
abstract PURPOSE: To deposit electrolytic copper having a low content of hydrogen and high quality on a cathode starting sheet by subjecting an electric copper plate stripped from a cathode mother sheet in the stage of electrolytic refining of copper to a defatting treatment then using the same as the cathode starting sheet for electrolysis. n CONSTITUTION: An electric copper mother sheet stripped from a cathode is immersed for 0.5W10min in an org. solvent of alcohol, ether, ketone, ester or a halogenated hydrocarbon such as trichloroethane, trifluoroethylene, freon or the like to subject the sheet to a defatting treatment in the stage of depositing electolytic copper on the cathode with crude copper as an anode and using the same as the mother sheet for the cathode. Said sheet may be otherwise defatted in a bath contg. an alkali or neutral chelate or an inorg. alkali salt bath. If such plate is used as a cathode starting sheet for electrolysis, the electric copper having a low content of hydrogen and high quality is electrolytically deposited on the cathode starting sheet. n COPYRIGHT: (C)1984,JPO&Japio
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/BE-1001006-A3
priorityDate 1983-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 27.