http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S59229553-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 |
filingDate | 1983-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_876311c16381fded19f8ab6f03c41e21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7f77449810c16d872328281513d1359 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bdaf6577a88272ff3093c7660a2073b3 |
publicationDate | 1984-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-S59229553-A |
titleOfInvention | Photopolymerizable composition |
abstract | PURPOSE:To increase the rate of polymn. by using a specified oxime ester combined with aminophenyl ketone as a photopolymn. initiator. CONSTITUTION:An addition-polymerizable compound having >=100 deg.C b.p. under ordinary pressure and soluble in an org. solvent such as diethylene glycol di (meth)acrylate is blended with an oxime ester combined with aminophenyl ketone as a photopolymn. initiator. The oxime ester is represented by formula I (where Z is optionally substituted aryl, R1 is H or <=3C alkyl, and R2 is <=3C alkyl, aryl or <=3C alkoxy), and the aminophenyl ketone is represented by formula II (where each of R3-R6 is H or <=4C alkyl). It is preferable that an oxime ester represented by formula III (where R1 and R2 are said R1 and R2, respectively) is combined with 4,4'-bis(dimethylamino)-benzophenone or 4,4'-bis(diethylamino)benzophenone. The resulting photopolymerizable composition contg. the photopolymn. initiator has superior sensitivity to active light, and it is used as a material for a printing plate or a photoresist for forming a circuit by etching or plating. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2003096118-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2001233842-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7829257-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2357293-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S604502-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0461006-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S60239738-A |
priorityDate | 1983-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 41.