http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S59218440-A

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filingDate 1983-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8edf579c856e2279d0fad68d94aac268
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f4f55994d446daf25d2292a5d49e46c
publicationDate 1984-12-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S59218440-A
titleOfInvention Photosensitive resin for plate-making
abstract PURPOSE:To enable aq. development and easily giving ink receptivity through thermal treatment by reacting one of p-aminochalkones with a polymer having cyclic acid anhydride groups on the main chain or side chains. CONSTITUTION:A compd. of 4'-aminochalkones represented by the formula is used and a maleic anhydride monomer is used to give cyclic acid hydride groups to a polymer preferably in a compsn. ratio of 1:5-1:0.5. A preferable number average mol.wt. of the polymer is 10-1,000 thousand, and a highly substd. resin is obtained in a reaction in a solvent preferably at >=40 deg.C and for a reaction time length of 5-24hr. A part of major part of said anhydride groups is substd. by said chalkones. A necessary introduction rate of the photosensitive groups is 20-60mol%. A photosensitive layer is formed by coating a support with the solvent soln. of said chalkone.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012067186-A
priorityDate 1983-05-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 24.