| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d3de607e369a55daf2120ea4267a4827
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_026917a1661e94c21035d1c5d1fa135e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L77-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L27-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L23-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L29-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L29-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F8-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-00 |
| filingDate |
1983-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_309c7f32be6ea0bdcc90fe138fa9835d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30370981fb41cf80acd4d34bf3a81bf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3fe32f86d82f6d60dcc6b3f41600c32 |
| publicationDate |
1984-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-S59211037-A |
| titleOfInvention |
Photosensitive resin composition |
| abstract |
PURPOSE:To improve the developability and the adhesive strength to a substrate by adding specified water-solubilized nylon to a photosensitive polyvinyl alcohol deriv. contt. styrylpyridinium groups or styrylquinolinium groups. CONSTITUTION:Water-solubilized 6-nylon having dialkylamino groups substituted for 40-70% of hydrogen atoms at the alpha-positions of the poly-epsilon-capracide structure is added to a composition contg. a photosensitive polyvinyl alcohol deriv. having 200-4,000 deg. of polymn. of the principal chain and 70-98mol% degree of saponification as a photosensitive element. The polyvinyl alcohol driv. contains 0.3-40mol% constituent units represented by general formula I (where Y is a pyridinium group represented by general formula II or a quinolinium group represented by general formula III; R1 is H, alkyl or aralkyl; R2 is H or alkyl; X<-> is an anion; (m) is 0 or 1; and (n) is an integer of 1-6). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4868241-A |
| priorityDate |
1983-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |