http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S59200238-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-72 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-60 |
filingDate | 1983-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af6c0ee833ff0734c178f0067d44f24e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca1b2e6a1dd8ea593e2c3248f37c368a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2b56779dd07d6c6ccebefcba24dfd9e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b4ff15d726093861a52cb4710df2e7b |
publicationDate | 1984-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-S59200238-A |
titleOfInvention | Production of photomask |
abstract | PURPOSE:To reutilize a photomask base plate on which a mask pattern is formed by removing the mask pattern from said base plate, polishing again the surface and forming a fresh mask pattern thereon. CONSTITUTION:A quartz glass base plate on which a mask pattern is formed is dipped for one minute in an aq. mixed soln. composed of ammonium ceric nitrate and perchloric acid, by which the chromium layer is etched away. The aq. mixed soln. prepd. by dissolving 200g ammonium ceric nitrate and 500cc perchloric acid in 1l water is used. The quartz glass base plate is sandwiched between two sheets of iron rotary discs adhered with polishing cloths and the two surfaces of the base plate are polished about 10mu per one side surface by the rotary discs using an agrasive material prepd. by mixing cerium oxide and water. A mask pattern is formed by an ordinary method on the quartz glass base plate formed in such a way, and said plate is used as a photomask. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011227260-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018106147-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2017181733-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20180073451-A |
priorityDate | 1983-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.