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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
filingDate 1983-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_33aef5485a141afe14b138d9a91a13ca
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publicationDate 1984-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S59171948-A
titleOfInvention Photosensitive resin composition
abstract PURPOSE:To simplify a heating step and to speed up a manufacturing process by using a photosensitive resin compsn. comprising an alkali-soluble polyfunctional polyester acrylate monommer or oligomer, a photopolymn. initiator, and a sensitizer, as a photoresist for a printed circuit plate. CONSTITUTION:An alkali-soluble polyfunctional polyester acrylate monomer or oligomer used for the essential component of a phototsensitive resin compsn. gives superior physical property to a coating film and ahrdenability characteristics and permits easy peeling of the unhardened part and hardened part due to exposure using an aq. alkaline soln. Said polyfunctional polyester acrylate is a compd. having plural acryloyloxy groups, such as (CH2=CHCOOCH2)2C(CH3)2 or (CH2=CHCOOCH2)3C-C2H5. Preferably, it has 150-1,000mol.wt. As a polymn. initiator, benzoin or benzoin ethyl ether initiating photopolymn. reaction with UV rays is used in an amt. of 1-20pts.wt. per 100pts.wt. of said monomer or oligomer. As said sensitizer, alkylamines, such as triethylamine, and ethyleneamines, such as triethylenetetraamine, are used in an amt. of 1-2pts.wt. per 100pts.wt. of said monomer or oligomer.
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Total number of triples: 39.