http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5914638-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_60e21de07fa18fc54e2150daffc14654 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate | 1982-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc357ff803800bc1d24816933b728618 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7672000709015f662894f0e8fe7c40ce http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4777e75d2ffcec372d40da7b03744a9d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8e76f5c76fa2e6b5e4234c18b97f351 |
| publicationDate | 1984-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S5914638-A |
| titleOfInvention | Mask for exposing x-ray and manufacture thereof |
| abstract | PURPOSE:To obtain ultrafine X-ray exposure mask pattern from an X-ray absorber layer made of Ta by reactively sputter etching with CBrF3 gas with high molecular material or SiO2 as a mask. CONSTITUTION:Glass 2 is superposed on an Si substrate 1, and X-ray absorber 14 of Ta is deposited in a thickness of approx. 4,000Angstrom . A photoresist mask 15' is coated, and a layer 14' is formed by reactively sputter etching with CBrF3 gas. Subsequently, a mask is covered on the substrate 1, and an Si layer 1' is formed by etching. According to this structure, an X-ray exposure mask which has ultrafine size of submicron size and vertical side surface can be obtained. |
| priorityDate | 1982-07-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6384 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419547108 |
Total number of triples: 19.