http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5749231-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d7576285d411d00c697e07270d2814a
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3205
filingDate 1980-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ed456c66db7629480d7372a737ff3f63
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5cd868c37b6f8ba25dfa21e68523f262
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e3bd03858d207ae14643487c620faff
publicationDate 1982-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S5749231-A
titleOfInvention Forming method for electrode and wiring layer
abstract PURPOSE:To facilitate the formation of an electrode wiring layer by forming the second metallic film readily bromided with Ti or the like on an aluminum layer, selectively etching the second metallic film with bromine gas plasma and removing the aluminum layer with chlorine gas plasma. CONSTITUTION:A hole is opened at the oxidized film 2 on the surface of a substrate 1 formed with an active region 4 to expose the region 4, and aluminum film 3 is formed on the overall surface. A Ti film 5 (or Nb, Ta, Au, Mo bromide is readily formed as a metallic layer) is, for example, formed thinly consecutively onto the film 3. With the resist pattern 5 as a mask it is etched with plasma with Br2 gas to etch the film 5, and then the film 3 is etched with plasma with CCl4 gas of diluted Ar. Thus, it can prevent the formation of alumina on the film 3, thereby facilitating the formation of aluminum electrode wire by plasma etching.
priorityDate 1980-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S556844-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID260
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID259
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24526
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527288
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559213
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24408
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556587
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5943
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9989226
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451818717
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556973
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559212

Total number of triples: 31.