| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5f1d94149195ace6a4c0b82f24c72825
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-128 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0085
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-54 |
| filingDate |
1980-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e036ea0bb249798fca81a9dea5a265e1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_64621f01cf57eeb1eb5271dd4e334c1f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10816e6a75b3a95deea8ae6ce3a4d056 |
| publicationDate |
1982-03-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-S5744143-A |
| titleOfInvention |
Composition and method for forming micropattern |
| abstract |
PURPOSE: To enhance the dimensional stability, working accuracy, etc. of a resist during development by blending a polymer with an aromatic azide compound or the compound and an aromatic compound having a vinyl group to prepare a composition. n CONSTITUTION: A composition for forming a micropattern is obtd. by blending a polymer such as polymethyl methacrylate which has no aromatic ring in the principal and side chains and is easily removed by incineration in gas plasma with an aromatic azide compound or the compound and an aromatic compound having a vinyl group. The desired part alone of a coated film of said composition is irradiated with corpuscular radiation or electromagnetic waves, and the aromatic compound in the unirradiated part alone is inactivated in the coated film and removed in gas plasma to form a micropattern. The aromatic azide compound includes 4,4'-diazidodiphenyl ether. n COPYRIGHT: (C)1982,JPO&Japio |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5852634-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6037548-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5860537-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H023493-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5923341-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S60114857-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H045178-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0438346-B2 |
| priorityDate |
1980-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |