http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5730832-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_385752f237551ca1b257f160a0f2434b |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 |
filingDate | 1980-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9efd414682a0d0d73c5c1a84e9390c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_377a5d50d600aab0a79feff3791a4997 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0962fdcd82dd5fc0f40bb2b4df68f176 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99d5799af4034aa6d5beff711234e897 |
publicationDate | 1982-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-S5730832-A |
titleOfInvention | Developing solution for use in positive type photoresist |
abstract | PURPOSE:To obtain a high quality image without adversely affecting integrated circuit elements in its manufacture, by using a mixture of a specified cyclic amine and water as a developing solution for a positive type photoresist derived from 1,2- quinonediazide. CONSTITUTION:A cyclic amine represented by the general formula shown R1, R2 being H or alkyl and m, n being >=2, such as 1, 8-diazabicyclo-(5,4,0)-7-undecene is preferable. A water-soluble monocyclic amine such as pyrrole or pyridine is also useful. A mixture of >=1 kinds of these amines and an ion-exchanged water is used as a developing solution for a positive type photoresist derived from 1,2-quinonediazide. This photoresist layer is formed on a silicon wafer, exposed, and developed with said developing solution, thus permitting integrated circuit elements superior in characteristics and resolution to be formed by absence of alkali metals and alcohol impairing its characteristics. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02160246-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2116902-A4 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2116902-A1 |
priorityDate | 1980-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 32.