http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5727928-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1374dd16777534b65ad4422333245af8 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C18-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G23-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01G23-053 |
| filingDate | 1980-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_776e579350d0af32798d962e8370c1ef http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a457b3724b6e8f76b8b340683ad119cd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1025b225e5ad5ad77e64dd1182167d1a |
| publicationDate | 1982-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S5727928-A |
| titleOfInvention | Manufacture of thin titanium oxide film |
| abstract | PURPOSE: To stably form a thin titanium oxide film on a molding as a substrate with high productivity by forming a thin titanium oxide film on the molding using alkyl titanate contg. alkali metal or alkali metallic ion. n CONSTITUTION: A thin titanium oxide film is formed on an org. or inorg. molding or an org. and inorg. composite molding as a substrate using alkyl titanate contg. monovalent alkali metal and/or alkali metallic ion by ≥0.5mol% per one atom titanium. The used alkyl titanate is represented by Ti l O m R n (where R is alkyl and each of l, m and n is an integer). Especially in case of m=4+(l-1)×3, n=4+(l-1)×2 and l=1W30, the alkyl titanate is preferably used from the viewpoint of high film formability and the characteristics of the resulting dielectric layer. The preferred alkyl titanate is tetrabutyl titanate or tetrapropyl titanate. n COPYRIGHT: (C)1982,JPO&Japio |
| priorityDate | 1980-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.