http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S57180633-A

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filingDate 1981-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_072a241152a22dc3250131ecc093c6a6
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publicationDate 1982-11-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S57180633-A
titleOfInvention Curable polyimide resin composition
abstract PURPOSE: A curable polyimide resin composition having excellent solvent resistance and low moisture absorption and being suitable as a protective coating material for semiconductor devices, prepared by mixing a polyimide or a polyamide-acid with a curable resin. n CONSTITUTION: An organic tetracarboxylic acid dianhydride (e.g., pyromellitic dianhydride, benzophenonetetracarboxylic dianhydride) is reacted with an organic diamine (e.g., m-phenylenediamine, 1,5-diaminonaphthalene) to produce a polyamide-acid or the latter is further ring-closed by dehydration to form a polyimide. Then, the resulting polyimide or polyamide-acid is mixed with a curable resin (e.g., phenol resin, epoxy resin) to form the purpose curable polyimide resin composition. Thus, the polyimide skeleton which is poor in solvent resistance is fixed in a three-dimensional network, and its solvent resistance is improved. n COPYRIGHT: (C)1982,JPO&Japio
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0433809-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S6211727-A
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priorityDate 1981-04-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 31.