http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S57170929-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-28
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filingDate 1982-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b1c1c36d7e18f60781741d37c3d6a72
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publicationDate 1982-10-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S57170929-A
titleOfInvention Photosensitive polymeric composition
abstract PURPOSE: The titled composition, containing a specific polyamic acid, an aromatic bisazide compound and an amine compound containing an unsaturated group, having a high sensitivity and good degree of resolution, and capable of being a heat-resistant polyimide high polymer by the heat treatment after the formation of an image. n CONSTITUTION: A composition consisting of (A) 100pts.wt. polyamic acid containing repeating units of formulaI(R 1 is trifunctional or tetrafunctional organic group; R 2 is bifunctional organic group; n is 1 or 2) essentially, (B) 0.1W 100pts.wt. aromatic bisazide compound of formula II[W is -OH, -OR 3 , -R 4 -OH, -SiR 3 3 , -COOH, -COOR 3 , -NR 2 3 or -NH 2 (R 3 is lower alkyl; R 4 is alkylene); m is 0 or 1]and (C) 1W400pts.wt. amine compound of formula III (R 5 , R 6 , R 7 and R 9 are H, lower alkyl, phenyl or vinyl; R 8 is alkylene) and if necessary (D) a photosensitizer, e.g. anthrone. n COPYRIGHT: (C)1982,JPO&Japio
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H02149850-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S63155141-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8852726-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8231959-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7439005-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H03168214-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S62267358-A
priorityDate 1982-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 37.