http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S57119341-A

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filingDate 1981-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b37c64d819ea8962054cb6f623542351
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publicationDate 1982-07-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S57119341-A
titleOfInvention Photosensitive material for heat development
abstract PURPOSE:To form a photosensitive material for heat development of large max. image density, a low gamma value and wide exposure latitude by using two kinds of silver halide of different sensitivities as photosensitive silver halide components. CONSTITUTION:High sensitivity silver halide and low sensitivity silver halide of >=0.5log (exposure) difference of photosensitivity are used in combination. More specifically, an emulsion contg. (A) 1 part org. silver salt (silver salt of C10-40 long chain aliphatic carboxylic acid, e.g.; silver salt of behenic acid) (mol, hereinafter the same), (B) 0.001-0.7 part above-mentioned high sensitivity silver halide and 0.001-0.7 part low sensitivity silver halide, and (C) 0.05-10 parts reducing agent (e.g.; phenols) is coated on a substrate at 0.1-4g/m<2> ratios of org. silver salt (expressed in terms of silver), whereby the photosensitive material for heat development is formed.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1635216-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1582919-A1
priorityDate 1981-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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