http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5672444-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_44f82521bd7b49adba4be2e3e4f3b66a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-80 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F4-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-68 |
| filingDate | 1979-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd75cf890194a92ec9f7cccea4b98ef6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32d95547d14f9b18794550cefdcb4586 |
| publicationDate | 1981-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-S5672444-A |
| titleOfInvention | Production of photomask |
| abstract | PURPOSE:To obtain a metal mask of high accuracy by forming a high polymer film epoxy groups on a metal mask substrate, forming required resist layers by means of a photosensitive resin film on said film and selectively removing the exposed high polymer film then the metal layer with said images as a mask. CONSTITUTION:A high polymer film 7 having epoxy groups such as a copolymer of glycidyl methacrylate and ethyl acrylate is formed on the metal layer 2 on a transparent substrate 1. Required resist images 3 are formed by using a photosensitive resin on the film 7 in conventional method, after which with the images 3 as a maks, the film 7 is plasma-treated to remove the film 7 of the exposed parts. Next, with the film 7 and the layer 3 as a mask, the metal layer 2 is selectively removed with an etching soln., and the exposed layer 2 is removed, thence the layer 3 and film 7 are removed. This yields the mask for extra LSIs etc. of decreased side etching rates of the metal patterns 2 and high accuracy, durability and resolution. |
| priorityDate | 1979-11-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 22.