http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S56149034-A

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filingDate 1980-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_05132447c2bb74c1219ea9d939095067
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publicationDate 1981-11-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S56149034-A
titleOfInvention Inorganic resist material
abstract PURPOSE:To facilitate the development and enhance the quality of a pattern by laying a middle layer made of amorphous Si, amorphous Ge or Te or composed of two or more among them on an amorphous chalcogenide layer and further laying a silver or silver-contg. layer on the middle layer. CONSTITUTION:Amorphous Se-base chalcogenide layer 2a is laid on substrate or material 1 on which a pattern is formed, and middle layer 2b made of amorphous Si, amorphous Ge or Te or composed of two or more among them is laid on layer 2a. On layer 2b silver or silver-contg. layer 2c is further laid to form inorg. resist material 2. Se-Ge, Se-S-Ge or the like is used as a substance forming layer 2a. Hydrogen-contg. amorphous Se and hydrogen-contg. amorphous Ge are especially suitable for use as the amorphous Si and the amorphous Ge for layer 2b, respectively. AgBr, AgCl, AgI, AgS or the like is suitable for use as a substance forming layer 2c.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004504633-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013167886-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2009041916-A1
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Total number of triples: 25.