http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S56126836-A

Outgoing Links

Predicate Object
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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
filingDate 1980-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0780c554ae1e565424eb6ec2eace26fa
publicationDate 1981-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S56126836-A
titleOfInvention Photosensitive lithographic original plate
abstract PURPOSE:To enhance the resistance of the unexposed part of a photosensitive layer contg. an o-quinone diazide compound to an alkali developer without lowering the high developability by separating the layer into two layers and making the upper layer insoluble in alkali much more than the lower layer. CONSTITUTION:On the surface of support 1 such as Al plate made hydrophilic, lower layer 3b, 3a (a part made soluble by exposure) of a mixture or condensate of an o-quinone diazide compound and an alkali-soluble resin is formed, and layer 3b, 3a is coated with upper layer 4b, 4a which is relatively insoluble in alkali and made of a mixture or condensate of an o-quinone diazide compound and an alkali- insoluble resin such as p-t-butylphenol-formaldehyde resin, p-phenylphenol-formaldehyde resin or other substituted phenol resin. Thus, a lithorgraphic plate making material is obtd.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S63217346-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S59187340-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H0253778-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S61156251-A
priorityDate 1980-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 23.