| abstract |
PURPOSE: To obtain a photosensitive resin composition useful as a positive type resist having superior adhesion to a substrate and slightly causing cracking by adding a copolymer of a conjugated diolefinic hydrocarbon, a monoolefinic unsatd. compound and an α,β-ethylenic unsatd. carboxylic acid together with a 1,2-quinonediazido compound. n CONSTITUTION: This photosensitive resin composition contains a copolymer of a conjugated diolefinic hydrocabon (A), a monoolefinic unsatd. compound (B) and an α,β-ethylenic unsatd. carboxylic acid (C) together with a 1,2-quinonediazido compound. As the hydrocarbon (A) 1,3-butadiene, isoprene or the like is preferably used. The quinonediazido compound may be 1,2-benzoquinonediazidosulfonic acid ester or 1,2-naphthoquinone-diazidosulfonic acid ester. n COPYRIGHT: (C)1981,JPO&Japio |