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filingDate 1980-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1981-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S56110934-A
titleOfInvention Processing solution for photosensitive laminate having alcohol-soluble polyamide layer
abstract PURPOSE:To enhance the safety of a processing soln. capable of performing development and etching by one-stage processing by adding a neutral salt of an aromatic sulfonic acid or a carboxylic acid to the soln to lower the alkalinity. CONSTITUTION:An alcohol-soluble polyamide layer and a photosensitive resin layer contg. photosoluble o-benzoquinone azide as a photosensitive material are formed in this order to manufacture a photosensitive laminate. A neutral salt such as Na salt of an aromatic sulfonic acid such as toluenesulfonic acid or a carboxylic acid such as salicylic acid is added to an alkaline aqueous alcohol soln. which develops the resin layer and etches the polyamide layer by the one-stage processing of the laminate. Thus, the alkalinity of the processing soln. is lowered to enhance the safety, and a higher developing speed and enhanced resolving power are attained.
priorityDate 1980-02-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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