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filingDate 1978-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1980-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S5562445-A
titleOfInvention Preparation of photosensitive resin plate
abstract PURPOSE:To form a photosensitive resin plate wide in the range of adequate exposure time and superior in sensitivity balance, by forming into a sheet a specified compound incorporated photosensitive resin. CONSTITUTION:1,4(or 1,2)-dioxynaphthalene (derivative) (a) represented by formula I or II (R1-R3, R1'-R3' are each H, alkyl, aryl, alkoxy, halogen, or the like), and benzoin alkyl ether (derivative) (b) represented by formula III (R is 1- 8C alkyl; R4 and R5 are H, 1-6C alkyl or halogen) are incorporated with 100pts. of photosensitive resin consisting of a mixture of a soluble polymer, such as polyamide or polyester, and a photopolymerizable unsaturated groups-containing compound, such as acrylamide or acrylate in amounts (a) about 0.005-0.5wt. pt. and (b) about 0.1-5wt. pts. preferably at a (a):(b) ratio of about 0.2-300 to form a sheet.
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type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 34.