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filingDate 1978-08-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 1980-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S5529551-A
titleOfInvention Removal of synthetic high polymer deposit
abstract PURPOSE: To remove synthetic high polymer deposits from polymerizers or molding devices effectively, using a mixture of specific organic solvents. n CONSTITUTION: High polymers, deposited on the inner wall of the device in polymerizing or molding a (co)polymer of cyanoolefins, (meth)acrylates, aromatic vinyl compounds, or diolefins, or a copolymer consisting of 80W99.8 parts by wt. of said monomers, are dissolved and removed with a specific organic solvent mixture of (a) 100 parts by wt. of one or more types of benzenes, acetone, methyl ethyl ketone, and acrylonitrile, and (b) 100 parts by wt. or less of one or more types of ≤10C aliphatic alcohols, e.g. methanol or hexanol, and ≤5C aliphatic glycols, e.g. ethylene or propylene glycol. n COPYRIGHT: (C)1980,JPO&Japio
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