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filingDate 1979-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea82130f404d6a9d9dbcee9e5d4f14f6
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publicationDate 1980-10-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S55127550-A
titleOfInvention Photosensitive resin composition
abstract PURPOSE:To obtain a photosensitive resin composition with high ultraviolet-polymerization activity by adding a specified imidazolyl ring dimer and a heterocyclic organic mercaptan compound to a radical-polymerizable ethylenic unsaturated compound. CONSTITUTION:An imidazolyl ring dimer represented by the formula (where Aryl is a condensed ring of two or more aromatic rings and the condensed ring may have a substituent) and a heterocyclic organic mercaptan compound such as 2-mercaptobenzimidazole are combined and used as a photopolymerization initiator. This initiator is mixed with a monomer such as trimethylolpropane acrylate, a binder, a pigment, etc., and the resulting coating material is coated onto a support such as a polyester film, dried, and covered with an overcoat layer to obtain a photosensitive material having high photopolymerizability and high storage stability. This material is esp. suitable for use in manufacture of a letterpress printing plate and materials related to electronics.
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