http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-S5453193-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1374dd16777534b65ad4422333245af8
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G18-83
filingDate 1977-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_445ba0a411a2aa1bb31f0a7e6ebb1bef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9537472b7e227e078f4d932927fb03f6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f0c9d9ecdda4b8acbb29236342e2cb2
publicationDate 1979-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-S5453193-A
titleOfInvention Photosensitive polymer and its preparation
abstract PURPOSE: To prepare a new elastomer for flexographic printing capable of being developed with an aqueous solvent, having a specific structure containing tetracarboxylic acid diester bonds, urethane bonds, aliphatic polyether bonds, etc.. n CONSTITUTION: A photosensitive polymer of the formula I [R 1 is H or methyl; R 2 is 2W5C alkylene; P is 1W20; Q is II (R 3 is 4W15C tetravalent aliphatic, alicyclic or aromatic group); R 4 is polyalkylene ether residue III (R 6 is 2W5C alkylene; S is 5W100) or polyester residue IV (R 7 is 2W8C divalent organic group; R 8 is 2W8C alkylene; t is 2W20); q is 0W10; R 5 is 2W15C divalent aliphatic, alicyclic or aromatic group; r is 0.2W10] n COPYRIGHT: (C)1979,JPO&Japio
priorityDate 1977-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393636

Total number of triples: 18.