http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1195448-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5128cfc84a0fb189fceb3cd240c44493 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-037 |
| filingDate | 1997-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c034469767a7533f6e8d986fc20d64b9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb20c6cdf57bb004d883e4aa396b073f |
| publicationDate | 1999-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1195448-A |
| titleOfInvention | Method for developing photosensitive resin composition |
| abstract | PROBLEM TO BE SOLVED: To provide a method for developing a photosensitive resin composition for obtaining a high-resolution pattern without causing residue or surface layer peeling during development and without lowering the solubility of a developer. I will provide a. SOLUTION: The photosensitive resin composition contains (A) a polyamide phenol containing a repeating unit represented by the following general formula (1): 100 parts by weight, and (B) naphthoquinonediazide: 1 to 50 parts by weight. Developing a photosensitive resin composition with an alkaline aqueous solution containing a nonionic surfactant to obtain a pattern. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005070763-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6472127-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7087799-B2 |
| priorityDate | 1997-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 189.