| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4404
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-44 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-285
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44 |
| filingDate |
1998-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_53316c88d4b5d30a4e79b6be1b6a7004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_930376d37f97a25aaf0c739a3add4766
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fbe0f1271032cdb3adc679be6ec53481 |
| publicationDate |
1999-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H1187270-A |
| titleOfInvention |
Method and apparatus for improving film deposition uniformity on a substrate |
| abstract |
A method and an apparatus for depositing a film on a substrate are provided. According to the present invention, a pre-wafer reaction layer comprises: Deposit on a susceptor located in the reaction chamber to form a susceptor coated with a pre-wafer reaction layer prior to film deposition. Subsequently, the deposition gas is supplied to the reaction chamber, so that the gas flows on the susceptor coated on the pre-wafer reaction layer and on the substrate, and forms a film on the susceptor coated on the pre-wafer reaction layer and on the substrate. . |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2010534935-A |
| priorityDate |
1997-05-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |