| abstract |
(57) [Summary] (with correction) [PROBLEMS] To provide a fine pattern using a photosensitive material which becomes insoluble in a developer by irradiation with a high energy beam, and a method for forming the fine pattern. SOLUTION: On a substrate, R is a methyl group or a t-butyl group, n is an integer from 4 to 10, and is represented by the formula (1), and X in the formula (1) is the following formula (2) ), A first step of forming a thin film composed of p-alkylcalixarene (meth) acrylate represented by any one of formulas (3) and (4), and a step of irradiating a desired region of the thin film with a high energy ray. A fine pattern forming method, comprising: a second step; and a third step of dissolving a portion of the thin film other than the desired region in a developer to form a fine pattern including the desired region of the thin film. |