http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H117128-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate | 1997-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d893ea20efbe42083f3fd2ecee5638a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fffc9ab1d382ccfd1a59ccc5eb62349 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_089b8e4ab23432f519b08f61c8863f7a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234 |
publicationDate | 1999-01-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-H117128-A |
titleOfInvention | Positive photoresist composition and multilayer resist material using the same |
abstract | PROBLEM TO BE SOLVED: To provide a resist having a good residual film ratio, an excellent development contrast between an exposed portion and an unexposed portion, an excellent resolution, an exposure margin, a focal depth width characteristic, and a sectional shape in forming an isolated pattern. Provided are a positive photoresist composition capable of forming a pattern, and a multilayer resist material using the positive photoresist composition. SOLUTION: (A) An alkali-soluble resin, (B) a quinonediazide group-containing compound, for example, naphtho of 2,4-bis [4-hydroxy-3 (4-hydroxybenzyl) -5-methylbenzyl] -6-cyclohexylphenol A positive photoresist composition containing a quinonediazide sulfonic acid ester, and a multilayer resist material using the same. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111596526-A |
priorityDate | 1997-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 321.