http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1165111-A

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filingDate 1997-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dea7fa82973645ae09b7289d47c92d43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0dd4a134f9fba3b7b9ffb5e49006385a
publicationDate 1999-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H1165111-A
titleOfInvention Method of forming resist film and method of manufacturing microstructure
abstract PROBLEM TO BE SOLVED: To provide a thick PMM having a uniform thickness and a uniform composition. A method for forming a PMMA film suitable for obtaining an A film is provided. A supporting substrate having a main surface is prepared. PMMA is dissolved in liquid MMA, and a polymerization initiator is added to obtain a resist raw material liquid. A resist raw material liquid is applied on the main surface of the support substrate. A PMMA film is placed on the main surface of the supporting substrate so as to sandwich the applied resist raw material liquid. MMA in the resist raw material solution is polymerized while pressing the PMMA film against the support substrate, and the PMMA film is bonded to the support substrate.
priorityDate 1997-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 27.