http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1154755-A

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filingDate 1997-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2d99062c6f2cbb27682f06f3f8e194c
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publicationDate 1999-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H1154755-A
titleOfInvention Semiconductor device manufacturing method and thin film transistor
abstract (57) [Summary] [PROBLEMS] To make the crystal grain size of a polycrystalline semiconductor film doped with an extremely low concentration of impurities uniform and to reduce a leak current. SOLUTION: An impurity-doped first semiconductor film 13 is provided. And an intrinsic second semiconductor film 14 are laminated and annealed by laser light to form a 5 × 1 A polycrystalline semiconductor film 15 containing a trace amount of impurities of about 0 16 to 3 × 10 17 cm −3 is formed. Such a semiconductor film has particularly improved back channel crystallinity, and when applied to a TFT, can control Vth within a range where there is no deterioration in characteristics, and can further reduce the off current of the TFT.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03067666-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2011081829-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009033120-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9030298-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005310131-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100347862-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009111364-A
priorityDate 1997-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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Total number of triples: 29.