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filingDate 1998-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2ec00bc8ba4941f9fcbad12b0e7a17e8
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publicationDate 1999-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-H1143643-A
titleOfInvention Low outgas paint
abstract [PROBLEMS] To provide a low-outgas paint having a reduced amount of outgas such as ammonia gas released from constituent materials of buildings such as clean rooms for high-integration semiconductor device manufacturing, museums and storages. provide. The low outgassing paint of the present invention comprises It is mainly composed of a liquid epoxy resin and a reactive diluent which reacts with an amine which is a curing agent, and the curing agent is mainly composed of an amine, preferably an amine which is hardly decomposed with time and changed into ammonia. The amine of the curing agent is preferably one modified with an organic component so as to make it less volatile.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009051977-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002242331-A
priorityDate 1997-04-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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