http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H1135650-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 |
| filingDate | 1997-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93c73d832f83b05a2bba1832f671c118 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fffc9ab1d382ccfd1a59ccc5eb62349 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8c7d3c52e02bd49d691d32b76c890c09 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d893ea20efbe42083f3fd2ecee5638a |
| publicationDate | 1999-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H1135650-A |
| titleOfInvention | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin |
| abstract | PROBLEM TO BE SOLVED: To provide a positive photoresist which does not contain a large amount of binuclear material, suppresses the generation of scum, has excellent resolution and coating properties, and has excellent heat resistance of a formed resist pattern. Provided are a novel novolak resin, a novolak resin precursor, a method for producing the same, and a positive photoresist composition containing the novolak resin for obtaining the composition. SOLUTION: One of the hydrogen atoms at the o-position or the p-position of the hydroxyl group of the phenol compound is substituted with an alkyl group or an alkenyl group having 1 to 3 carbon atoms, and the other two are linked by a methylene bond. A novolak resin precursor, wherein the number of oo bonds accounts for 30 to 70% of the total number of methylene bonds, and the weight average molecular weight of the conjugate is 300 to 10,000. A novolak resin obtained from the precursor, and a positive photoresist composition containing the novolak resin. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/SG-106040-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2013254193-A |
| priorityDate | 1997-07-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 148.