| abstract |
PROBLEM TO BE SOLVED: To provide a resist composition having high transparency to an ArF excimer laser, excellent dry etching resistance, and giving a stable and excellent pattern shape. SOLUTION: It contains an acid generator, a structural unit having an alicyclic hydrocarbon group and a group having a lactone structure as a group eliminated by the acid generator, and at least one oxygen atom, nitrogen atom or sulfur atom. And a ternary copolymer containing a structural unit having a functional group stable to an acid. |