http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11352033-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_12d24c0a12c3ecdb6d9a47d623d96e76 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N1-28 |
| filingDate | 1998-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67ca6ec608818aa586d5d6ee5ca59ed7 |
| publicationDate | 1999-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11352033-A |
| titleOfInvention | Ruthenium or vanadium analysis method |
| abstract | (57) Abstract: A method for accurately and quantitatively analyzing ruthenium and vanadium in an electrode material of an electrochemical capacitor (super-energy capacitor) in a short time and accurately. A carbon-supported ruthenium electrode and a vanadium electrode are made into a solution with hydrochloric acid or aqua regia, and the residue is heated and ashed, then further dissolved with an acid, and the solution is quantitatively analyzed by plasma emission analysis. After a mixed oxide of ruthenium oxide and vanadium oxide is melted with potassium sodium carbonate as an alkali flux, an aqueous solution is prepared using hydrochloric acid, and the solution is quantitatively analyzed by plasma emission analysis. As the measurement wavelength of plasma emission analysis, 240.272 nm or 267. for ruthenium. 876 nm is used, and in the case of vanadium, 292.402 nm or 311.071 nm is used. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020076701-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/RU-2627854-C1 |
| priorityDate | 1998-06-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 42.