| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L25-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-06 |
| filingDate |
1998-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_854f877ecf75b531cfa4bce646b3672e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_744db18086e3aed607e72c8a7c9eb81d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_96bb5b83bfa92d8b3cc169167f381123
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f02021336cb2076a5f61cd1e0351979f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af7fdb008f1ea38e81b87538fcf67529 |
| publicationDate |
1999-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-H11349760-A |
| titleOfInvention |
Radiation-sensitive composition containing novel polymer |
| abstract |
(57) [Summary] (Modifications) A photoresist composition containing a novel mixture of polymers. This mixture consists of a novolak resin and a polyvinylphenol resin, wherein at least one of the polymers is replaced by a group that is inert to the acid environment. When used in a photoresist formulation, the photoresist exhibits improved developability when exposed to eye-line irradiation. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1684118-A1 |
| priorityDate |
1998-06-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |