http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-H11338158-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bf44761bdb381c70c219ead3b3dd2216 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8de1f8a9f54428a5197cff38bf692b09 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-76 |
| filingDate | 1998-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_679673fbcd9ce539a94e7d206a6ebb3f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da03a3f3db918cc1390fbf3944136cd5 |
| publicationDate | 1999-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-H11338158-A |
| titleOfInvention | Photosensitive photomask material and photomask manufacturing method |
| abstract | (57) [Problem] To manufacture a photomask (emulsion mask) and a chromium blank in photomask manufacturing, enabling mass production and cost reduction of the photomask, and high-precision photomask manufacturing. SOLUTION: With respect to a photosensitive photomask material 1, on a substrate 2, a metal film 3, a radiation-sensitive resin layer 4 sensitive to radiation, and a radiation sensitive to the radiation-sensitive resin layer 4 are different. And a photosensitive layer 5 capable of receiving light in a wavelength region. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20030051183-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009134273-A |
| priorityDate | 1998-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 256.